Temperature dependence of Raman scattering in hexagonal indium nitride films

被引:66
|
作者
Pu, XD
Chen, J
Shen, WZ
Ogawa, H
Guo, QX
机构
[1] Shanghai Jiao Tong Univ, Dept Phys, Lab Condensed Matter Spect & Optoelect Phys, Shanghai 200030, Peoples R China
[2] Saga Univ, Fac Sci & Engn, Dept Elect & Elect Engn, Saga 8408502, Japan
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2006208
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on Raman spectroscopy study of hexagonal InN thin films grown by metal-organic vapor-phase epitaxy, with the emphasis on frequencies and linewidths of E-2(high) and A(1)(LO) modes in the temperature range from 93 to 443 K. The present InN exhibits a fundamental band gap of similar to 1.2 eV from photoluminescence and optical transmission spectra, which is in good agreement with the recent suggested parameter for intrinsic InN. The temperature dependence of the E-2(high) and A(1)(LO) phonons can be described well by a model which has taken into account the contributions of the thermal expansion of the crystal lattice, the strain between InN thin films and sapphire substrates, as well as three- and four-phonon coupling. Micro-Raman mapping results also demonstrate the high uniformity of the studied InN. (c) 2005 American Institute of Physics.
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页数:6
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