Giant magnetoresistance in Ni-Fe/Co/Al-AlOx/Co/Ni-Fe/Fe-Mn ferromagnetic tunnel junctions

被引:0
|
作者
Sato, M
Kikuchi, H
Kobayashi, K
机构
[1] Fujitsu Labs Ltd, Atsugi, Kanagawa 24301, Japan
[2] Fujitsu Labs Ltd, Kawasaki, Kanagawa 211, Japan
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To develop candidate magnetic sensors for the future generation of magnetic read heads, we have fabricated Ni-Fe/Co/Al-AlOx/Co/Ni-Fe/Fe-Mn/Ni-Fe ferromagnetic tunnel junctions with oxidized Al barriers. To form the barrier layer, the Al was oxidized in air or in oxygen plasma. These junctions showed changes in tunnel resistance (magneto-resistance ratio) of 10 to 15% upon the application of a magnetic field. Some of the junctions exhibited good thermal stability over 300 degrees C and the magneto-resistance (MR) ratios were increased by annealing. The largest MR ratio after annealing at 300 degrees C for one hour was 24%, which is much larger than that of spin-valve films. The junctions with naturally oxidized barriers and plasma-oxidized barriers had almost the same properties, but the plasma-oxidization process is much faster. Current research indicates that ferromagnetic tunnel junctions have good potential for use in magnetic read heads.
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页码:204 / 211
页数:8
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