Formation of anodic oxide films at the vanadium metals: A photoelectric polarization and impedance study

被引：0
|
作者：
Lilin, SA
Grigorev, VP
Oshe, EK
Nechaeva, ON
Popova, AA
机构：
[1] ROSTOV STATE UNIV,PHYS & ORGAN CHEM RES INST,ROSTOV NA DONU 344006,RUSSIA
[2] RUSSIAN ACAD SCI,INST PHYS CHEM,MOSCOW 117071,RUSSIA
来源：
RUSSIAN JOURNAL OF ELECTROCHEMISTRY | 1996年 / 32卷 / 12期
关键词：
D O I：
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The initial stages of growth of thin oxide films on vanadium, niobium, and tantalum are studied in the course of polarization. The kinetics of anodic behavior of the metals in alcohol solutions of lithium perchlorate is shown to depend on both intrinsic and impurity changes in the defect structure of oxides caused by the polarization. A pronounced role played in the process rate control by charge-carrier transport through the passivating film is confirmed.
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页码：1349 / 1353
页数：5
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