Layer design for GaAs-based DHBTs enabling 28V high-power microwave applications

被引:0
|
作者
Maassdorf, A [1 ]
Kurpas, P [1 ]
Doser, W [1 ]
Brunner, F [1 ]
Bergunde, T [1 ]
Blanck, H [1 ]
Würfl, J [1 ]
Weyers, M [1 ]
Tränkle, G [1 ]
机构
[1] Ferdinand Braun Inst Hochstfrequenztech, D-12489 Berlin, Germany
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中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
We report on the realization of GaAs-based Double Heterojunction Bipolartransistors (DHBTs) using GaInP as collector material. With a collector thickness of 1.5 mum we achieved up to 70 V base-collector breakdown voltage. We used a GaAs spacer in conjunction with a highly doped n-type layer at the base-collector junction to compensate the reduction of the critical current density due to the base-collector heterojunction. The devices show a do current gain around 30 and proved to be very stable under on-wafer do conditions, i.e., we were able to obtain a dissipated power of up to 7.5 W and collector currents up to 1 A on a 4000 mum(2) area device. Regarding high-frequency behavior, the DHBTs exhibit cut-off frequencies up to 30 GHz, which are higher than that of a comparable SHBT (20 GHz). On-wafer load-pull measurements yielded 5 W of microwave output power for a 1680 mum(2) area device at 26 V bias and 2 GHz.
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页码:571 / 574
页数:4
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