High-resolution X-ray diffraction studies of molecular beam epitaxy-grown HgCdTe heterostructures and CdZnTe substrates

被引:11
|
作者
Sewell, RH [1 ]
Musca, CA
Dell, JM
Faraone, L
Usher, BF
Dieing, T
机构
[1] Univ Western Australia, Sch Elect Elect & Comp Engn, Crawley, WA 6009, Australia
[2] La Trobe Univ, Dept Elect Engn, Bundoora, Vic 3086, Australia
关键词
HgCdTe; x-ray diffraction; molecular beam epitaxy (MBE); reciprocal space maps (RSMs);
D O I
10.1007/s11664-005-0023-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Lattice mismatch between substrates and epitaxial layers of different mole-fractions can create a variety of distortions and defects in Hg(1-x)Cd(x)Te epilayers, thus degrading the performance of infrared detectors fabricated from this material. X-ray diffraction is a sensitive nondestructive technique, which allows in-depth characterization of the crystal lattice prior to detector fabrication. We present results of triple-axis diffractometry performed on single- and double-layer HgCdTe films grown on (211)B CdZnTe substrates by molecular beam epitaxy (MBE). In this study, both the omega and 2 theta diffraction angles have been recorded absolutely so that the diffraction peaks in the RSMs can be positioned directly in reciprocal space, without requiring reference to a substrate peak. The positions of both surface-symmetric and asymmetric diffraction peaks have been used to extract lattice spacings parallel and perpendicular to the (211) growth direction. The relaxed lattice parameter of each epilayer has been calculated assuming that the layers are elastically strained. The low symmetry of the (211) growth direction, coupled with the anisotropic elasticity of zinc-blende semiconductors, results in monoclinic distortion of the lattice, as observed in these samples. In double-layer samples, the mosaicity of both layers is greater than that observed in single epilayers. Layers subjected to a Hg-saturated anneal show greater lattice distortion than as-grown samples.
引用
收藏
页码:795 / 803
页数:9
相关论文
共 50 条
  • [1] High-resolution X-ray diffraction studies of molecular beam epitaxy-grown HgCdTe heterostructures and CdZnTe substrates
    R. H. Sewell
    C. A. Musca
    J. M. Dell
    L. Faraone
    B. F. Usher
    T. Dieing
    Journal of Electronic Materials, 2005, 34 : 795 - 803
  • [2] HIGH-RESOLUTION X-RAY-DIFFRACTION STUDY OF ZNSE/GAAS HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY
    SOU, IK
    MOU, SM
    CHAN, YW
    XU, GC
    WONG, GKL
    JOURNAL OF CRYSTAL GROWTH, 1995, 147 (1-2) : 39 - 46
  • [3] High Resolution X-ray Diffraction Studies of MBE-Grown HgCdTe Layers on Bulk-Grown CdZnTe Substrate
    Priyanthi M. Amarasinghe
    Syed B. Qadri
    Priyalal S. Wijewarnasuriya
    Journal of Electronic Materials, 2015, 44 : 2762 - 2767
  • [4] High Resolution X-ray Diffraction Studies of MBE-Grown HgCdTe Layers on Bulk-Grown CdZnTe Substrate
    Amarasinghe, Priyanthi M.
    Qadri, Syed B.
    Wijewarnasuriya, Priyalal S.
    JOURNAL OF ELECTRONIC MATERIALS, 2015, 44 (08) : 2762 - 2767
  • [5] X-ray diffraction study of GaSb grown by molecular beam epitaxy on silicon substrates
    Rodriguez, J. B.
    Madiomanana, K.
    Cerutti, L.
    Castellano, A.
    Tournie, E.
    JOURNAL OF CRYSTAL GROWTH, 2016, 439 : 33 - 39
  • [6] Secondary-ion-mass spectrometry and high-resolution x-ray diffraction analyses of GaSb-AlGaSb heterostructures grown by molecular beam epitaxy
    Gerardi, C
    Giannini, C
    De Caro, L
    Tapfer, L
    Rouillard, Y
    Jenichen, B
    Däweritz, L
    Ploog, KH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03): : 836 - 842
  • [7] HIGH-RESOLUTION X-RAY-DIFFRACTION STUDIES OF ALGAP GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY
    BI, WG
    DENG, F
    LAU, SS
    TU, CW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (02): : 754 - 757
  • [8] High-resolution X-ray diffraction analysis of InGaAs/AlAsSb coupled double quantum wells grown by molecular beam epitaxy
    Mozume, T.
    Gozu, S.
    JOURNAL OF CRYSTAL GROWTH, 2009, 311 (07) : 1707 - 1710
  • [9] Minority carrier lifetime and noise in abrupt molecular-beam epitaxy-grown HgCdTe heterostructures
    Sewell, R
    Musca, CA
    Dell, JM
    Faraone, L
    Józwikowski, K
    Rogalski, A
    JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (07) : 639 - 645
  • [10] Minority carrier lifetime and noise in abrupt molecular-beam epitaxy-grown HgCdTe heterostructures
    R. Sewell
    C. A. Musca
    J. M. Dell
    L. Faraone
    K. Józwikowski
    A. Rogalski
    Journal of Electronic Materials, 2003, 32 : 639 - 645