Distributed Bragg feedback intensity modulator in Ti:LiNbO3

被引：9
|
作者：
Kim, R [1 ]
Zhang, J
Eknoyan, O
Taylor, HF
Smith, TL
机构：
[1] Texas A&M Univ, Dept Elect Engn, College Stn, TX 77843 USA
[2] 3M Co, Corp Res Mat Lab, 3M Ctr, St Paul, MN 55144 USA
来源：
ELECTRONICS LETTERS | 2005年 / 41卷 / 18期
关键词：
D O I：
10.1049/el:20052450
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A distributed feedback electro-optic intensity modulator in Ti:LiNbO3, utilising Bragg reflectors etched in an amorphous Si overlay film, is demonstrated. A maximum modulation depth of 94% is realised at an operating wavelength of 1542 nm.
引用
收藏
页码：1028 / 1030
页数：3
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