All-Dielectric Heterogeneous Metasurface as an Efficient Ultra-Broadband Reflector

被引:37
|
作者
Yao, Yuhan [1 ]
Wu, Wei [1 ]
机构
[1] Univ Southern Calif, Ming Hsieh Dept Elect Engn, 3737 Watt Way, Los Angeles, CA 90089 USA
来源
ADVANCED OPTICAL MATERIALS | 2017年 / 5卷 / 14期
关键词
all-dielectric metasurfaces; broadband reflector; cryogenic etching; nanoimprint lithography; PLASMONIC METASURFACES; NANOIMPRINT LITHOGRAPHY; LIGHT; INDEX; METAMATERIALS; TECHNOLOGY; FILTERS; PHASE; GAP;
D O I
10.1002/adom.201700090
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Conventional all-dielectric metasurfaces made from high-index and low-loss materials (such as Si or GaAs) can achieve high optical efficiencies as well as broadband characteristics, mostly for the infrared (IR) light. However, maintaining the bandwidth and efficiency for conventional all-dielectric metasurfaces for visible or near-IR light becomes challenging, due to the limitations from material selection as well as fabrication techniques. In this paper, the idea of heterogeneous all-dielectric metasurfaces is proposed for a better metasurface design in shorter-wavelength ranges. An ultra-broadband reflector, as a proof-of-principle demonstration, is presented in this paper, both numerically and experimentally. The broadband reflector demonstrates a good optical efficiency, a broadband reflectance, as well as a great manufacturability. Nanoimprint lithography patterning process and advanced etching recipes are developed for the large-area and low-cost heterogeneous metasurface fabrication.
引用
收藏
页数:9
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