Vacuum deposition of Silicon oxide on the nylon 6 films utilizing silicon monooxide as an evaporation material

被引:4
|
作者
Kawasaki, M
Kimura, Y
Iwasaki, T
Yamane, H
机构
[1] Kawasaki Registed Tech Consulting Off, Kyoto 6011334, Japan
[2] Kyoto Inst Technol, Dept Polymer Sci & Engn, Kyoto 6068585, Japan
[3] Kyoto Inst Technol, Cooperat Res Ctr, Kyoto 6068585, Japan
[4] Kacho Jr Coll, Kyoto 6050062, Japan
[5] Kyoto Inst Technol, Grad Sch, Div Adv Fibro Sci, Kyoto 6068585, Japan
关键词
D O I
10.2115/fiber.54.11_577
中图分类号
TB3 [工程材料学]; TS1 [纺织工业、染整工业];
学科分类号
0805 ; 080502 ; 0821 ;
摘要
Silicon monoxide (SiO) amorphous layer was deposited on the biaxially oriented nylon 6 films in a vacuum evaporator. This deposited layer tightly attaches to the nylon film. SiO deposited nylon 6 films thus obtained are transparent and show a high barrier to the water vapor and oxgen. Wettability of the SiO surface of the film to the water, ink, and the adhesives are satisfactory for the gravure printing and lamination with polyolefin films. It was found that the gloss of nylon film, which reflects the surface roughness of the film, affects the uniformity of SiO deposited layer on the nylon film and barrier property of the deposited films. Permeabilities of the water vapor and oxygen through the SiO deposited nylon films were fairly high just after the deposition, especially when the deposited layer was thin, and then decreased to lower equilibrium values. These equilibrium values are surprisingly low comparing with other high barrier films such as nylon and polypropylene films coated with poly(vinylidene chloride). Further the SiO vacuum deposition was continuously carried out on the running nylon film. We found that the thickness of the silicon oxide layer on the nylon film and the water permeability are strongly related to the running velocity of the nylon film and the applied electric current to the heater.
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页码:577 / 582
页数:6
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