Properties of the Passive Film on Alloy 22 in Chloride Solutions Obtained by Electrochemical Impedance
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作者:
Rodriguez, Martin A.
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Univ Nacl Gen San Martin, Comis Nacl Energia Atom, Inst Sabato, RA-1650 Buenos Aires, DF, ArgentinaUniv Nacl Gen San Martin, Comis Nacl Energia Atom, Inst Sabato, RA-1650 Buenos Aires, DF, Argentina
Rodriguez, Martin A.
[1
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Carranza, Ricardo M.
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Univ Nacl Gen San Martin, Comis Nacl Energia Atom, Inst Sabato, RA-1650 Buenos Aires, DF, ArgentinaUniv Nacl Gen San Martin, Comis Nacl Energia Atom, Inst Sabato, RA-1650 Buenos Aires, DF, Argentina
Carranza, Ricardo M.
[1
]
机构:
[1] Univ Nacl Gen San Martin, Comis Nacl Energia Atom, Inst Sabato, RA-1650 Buenos Aires, DF, Argentina
Impedance measurements were performed for alloy 22 in the passive and transpassive range, in 1 M NaCl at 90 degrees C. A R-Omega-(R//CPE) circuit model was applied in the full passive range, where R was the film resistance. This model also applied for a wide range of chloride concentrations and pH values, at the open circuit potential. Two time constants were observed at the beginning and at the end of the passive range. In these cases, the resistances for the ion transfer might be located at the film interfaces, and not in the film itself. The protective properties of the film improved with polarization time due to the thickening and ageing of the film. The film resistance and the space charge layer thickness increased with the potential. The oxidation of Cr-3 broken vertical bar to Cr-6 vertical bar occurred in the film at high potentials, followed by the transpassive dissolution. In the pre-transpassive range of potentials, the film showed a p-type electronic character, while the ionic properties were that of a passive film. The passive film of alloy 22 was an n-type semiconductor, which changed to a p-type for the high passive potentials. N-D = 2.7 x 10(20) cm(-3) and E-FB = -0.551 V-SCE were determined. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3581034] All rights reserved.
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Penn State Univ, Dept Mat Sci & Engn, Ctr Electrochem Sci & Technol, University Pk, PA 16802 USAPenn State Univ, Dept Mat Sci & Engn, Ctr Electrochem Sci & Technol, University Pk, PA 16802 USA
Macdonald, DD
Sun, A
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Penn State Univ, Dept Mat Sci & Engn, Ctr Electrochem Sci & Technol, University Pk, PA 16802 USAPenn State Univ, Dept Mat Sci & Engn, Ctr Electrochem Sci & Technol, University Pk, PA 16802 USA
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Univ Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, BrazilUniv Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, Brazil
Soares, Renata B.
Campos, Wagner R. C.
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CDTN, Ctr Desenvolvimento Tecnol Nucl, BR-31270901 Belo Horizonte, MG, BrazilUniv Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, Brazil
Campos, Wagner R. C.
Gastelois, Pedro L.
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CDTN, Ctr Desenvolvimento Tecnol Nucl, BR-31270901 Belo Horizonte, MG, BrazilUniv Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, Brazil
Gastelois, Pedro L.
Macedo, Waldemar A. A.
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CDTN, Ctr Desenvolvimento Tecnol Nucl, BR-31270901 Belo Horizonte, MG, BrazilUniv Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, Brazil
Macedo, Waldemar A. A.
Dick, Luis F. P.
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Univ Fed Rio Grande do Sul, Dept Met, Bento Goncalves Av 9500, BR-91501970 Porto Alegre, RS, BrazilUniv Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, Brazil
Dick, Luis F. P.
Lins, Vanessa F. C.
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Univ Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, BrazilUniv Fed Minas Gerais, Dept Chem Engn, Antonio Carlos Ave 6627, BR-31270901 Belo Horizonte, MG, Brazil