Epitaxial suppression of the metal-insulator transition in CrN

被引:25
|
作者
Zhang, X. Y. [1 ]
Chawla, J. S. [1 ]
Deng, R. P. [1 ]
Gall, D. [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
来源
PHYSICAL REVIEW B | 2011年 / 84卷 / 07期
基金
美国国家科学基金会;
关键词
PHASE-TRANSITION; CRN(001); SYSTEMS; GROWTH; GAP;
D O I
10.1103/PhysRevB.84.073101
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Both single- and polycrystalline CrN layers are grown by reactive sputtering on MgO and quartz substrates, respectively. Temperature-dependent x-ray diffraction indicates a phase transition near 280 K to a low-temperature orthorhombic phase for polycrystalline CrN, while epitaxial constraints cause single-crystal CrN(001) and CrN(111) to remain in the cubic high-temperature phase. Electronic transport measurements indicate variable-range-hopping for the cubic phase below similar to 120 K, a discontinuity at the phase transition for the polycrystalline layers, strongly and weakly disordered metallic conduction for the orthorhombic phase if deposited at 600 and 800 degrees C, respectively, and a disorder-induced metal-insulator transition in the cubic phase.
引用
收藏
页数:4
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