Nitrogen-doping effect in a fast-pulled Cz-Si single crystal

被引:28
|
作者
Park, BM [1 ]
Seo, GH [1 ]
Kim, G [1 ]
机构
[1] LG Siltron Inc, Kumi 730350, Kyungbuk, South Korea
关键词
silicon; nitrogen doping; fast pulling; OSF-ring; COP;
D O I
10.1016/S0022-0248(00)00915-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In the nitrogen-doped and fast-pulled crystals, the nitrogen plays a role to disturb the growth of vacancy clusters by reducing the vacancy-rich region and the vacancy concentration. Thus, the oxidation-induced stacking fault ring (OSF-ring) is formed near the edge region and its width depends on the nitrogen-doping concentration. The vacancy clustering is severely suppressed and the increased residual vacancy causes the anomalous oxygen precipitation. A conceptual model based on the reduction of point defect concentration could explain the nitrogen-doping effects. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:74 / 81
页数:8
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