Electrochemical deposition and characterization of CoNi alloy thin films

被引:11
|
作者
Thanikaikarasan, S. [1 ]
Kanimozhi, R. [2 ]
Saravannan, M. [2 ]
Perumal, R. [1 ]
机构
[1] Saveetha Univ, Saveetha Sch Engn, Dept Crystal Growth & Nanotechnol, Chennai 602105, Tamil Nadu, India
[2] Annamalai Univ, Dept Elect & Commun Engn, Chidambaram 608002, Tamil Nadu, India
关键词
CoNi; Coercivity; Electrodeposition; Thin films; X-ray diffraction; COBALT; ELECTRODEPOSITION; PERFORMANCE; NICKEL; PHASE;
D O I
10.1016/j.matpr.2020.11.843
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cobalt and Nickel based alloys in industries attracted many researchers due to its significant features of film thickness, structural, surface morphology with film composition and magnetic properties. The present work focused the film thickness, structural, compositional and magnetic properties of Cobalt Nickel alloy thin film growth by simple, low cost, economically friendly chemical method. The films deposited on Copper substrate by galvanostatic electrodeposition technique. Structural properties showed that the deposited films have polycrystalline in nature. Structural features showed that the deposited films have polycrystalline nature with cubic structure. The crystallites are found to exhibit most prominent reflection along (2 0 0) plane. The parameters such as crystallite size, strain and dislocation density are determined. The films deposited are found to be smooth surface with stoichiometry. Vibrating sample magnetometric measurements have been used to determine the magnetic properties of the deposited films. The parameters such as coercivity, remanence, retentivity of the deposited films are estimated. (c) 2021 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the International Conference on Technological Advancements in Materials Science and Manufacturing.
引用
收藏
页码:10248 / 10251
页数:4
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