Recent advances in magnetron sputtering

被引:141
|
作者
Arnell, RD [1 ]
Kelly, PJ [1 ]
机构
[1] Univ Salford, Ctr Adv Mat & Surface Engn, Salford M5 4WT, Lancs, England
来源
SURFACE & COATINGS TECHNOLOGY | 1999年 / 112卷 / 1-3期
关键词
magnetron sputtering; structure zone modelling; pulsed DC sputtering;
D O I
10.1016/S0257-8972(98)00749-X
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The paper will outline the historical development of sputtering techniques up to the recent development of closed-field unbalanced magnetron sputtering (CFUBMS). Examples will then be given of the use of CFUBMS to develop advanced coatings for industrial applications, including corrosion resistant coatings for aerospace, hard ceramic coatings for wear resistance, and coatings with novel thermal and chemical properties. Finally, current development in the technology and in understanding of the principles of the process will be described. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:170 / 176
页数:7
相关论文
共 50 条
  • [1] Recent advances in magnetron sputtering
    Arnell, R.D.
    Kelly, P.J.
    Surface and Coatings Technology, 1999, 112 (01): : 170 - 176
  • [2] Recent advances in magnetron sputtering technology
    Musil, J
    SURFACE & COATINGS TECHNOLOGY, 1998, 100 (1-3): : 280 - 286
  • [3] Recent advances in modulated pulsed power magnetron sputtering for surface engineering
    Lin, Jianliang
    Sproul, William D.
    Moore, John J.
    Wu, Zhili
    Lee, Sabrina
    Chistyakov, Roman
    Abraham, Bassam
    JOM, 2011, 63 (06) : 48 - 58
  • [4] Recent advances in modulated pulsed power magnetron sputtering for surface engineering
    Jianliang Lin
    William D. Sproul
    John J. Moore
    Zhili Wu
    Sabrina Lee
    Roman Chistyakov
    Bassam Abraham
    JOM, 2011, 63 : 48 - 58
  • [5] RECENT ADVANCES IN PT COATING OF MICROSPHERES BY A BATCH MAGNETRON SPUTTERING PROCESS
    HSIEH, EJ
    MEYER, SF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (03): : 1205 - 1208
  • [6] Recent advances in electrocatalysts fabrication by magnetron sputtering for alkaline water electrolysis
    Gomez-Sacedon, C.
    Gonzalez-Elipe, A. R.
    Rodriguez-Pintor, V.
    Luque-Centeno, J. M.
    Yubero, F.
    Gil-Rostra, J.
    de Lucas-Consuegra, A.
    CURRENT OPINION IN ELECTROCHEMISTRY, 2025, 49
  • [7] Recent developments in magnetron sputtering
    Yu Xiang
    Wang Chengbiao
    Liu Yang
    Yu Deyang
    Xing Tingyan
    PLASMA SCIENCE & TECHNOLOGY, 2006, 8 (03) : 337 - 343
  • [8] RECENT DEVELOPMENTS IN SPUTTERING - MAGNETRON SPUTTERING.
    Thornton, John A.
    Metal Finishing, 1979, 77 (05) : 83 - 87
  • [9] Recent Developments in Magnetron Sputtering
    于翔
    王成彪
    刘阳
    于德洋
    邢廷炎
    Plasma Science and Technology, 2006, (03) : 337 - 343
  • [10] Recent Developments in Magnetron Sputtering
    于翔
    王成彪
    刘阳
    于德洋
    邢廷炎
    Plasma Science and Technology, 2006, 8 (03) : 337 - 343