Fabrication Tolerant TE-Pass Polarizer Based on Hybrid Plasmonic Bragg Grating

被引：0
|
作者：
Bai, Bowen [1 ]
Li, Xinbai [1 ]
Zhou, Zhiping [1 ]
机构：
[1] Peking Univ, Sch Elect Engn & Comp Sci, State Key Lab Adv Opt Commun Syst & Networks, Beijing 100871, Peoples R China
来源：
2016 IEEE 13TH INTERNATIONAL CONFERENCE ON GROUP IV PHOTONICS (GFP) | 2016年
关键词：
WAVE-GUIDE;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A TE-pass polarizer based on hybrid plasmonic Bragg grating for silicon-on-insulator platform is proposed. The structure greatly eases alignment tolerance compared with traditional plasmonic devices. An extinction ratio over 18 dB within bandwidth of 220 nm is achieved with compact length of 5.04 mu m.
引用
收藏
页码：132 / 133
页数：2
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