Characterization of cubic CdS thin films annealed in vacuum

被引:16
|
作者
Lozada-Morales, R
Rubin-Falfan, M
Zelaya-Angel, O
Ramirez-Bon, R
机构
[1] Inst Politecn Nacl, Ctr Invest & Estudios Avanzados, Dept Fis, Mexico City 07000, DF, Mexico
[2] Univ Autonoma Puebla, FCFM Benemerita, Puebla 72570, Mexico
[3] CIFUS, Hermosillo 83190, Sonora, Mexico
关键词
semiconductors; chemical synthesis; point defects; electronic transport;
D O I
10.1016/S0022-3697(98)00242-X
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Cubic CdS thin films were grown on glass substrates by chemical bath deposition and then thermally treated in the temperature range 180-430 degrees C at 10(-3) torr pressure of air atmosphere. From the [111] peak position in X-ray diffraction measurements, an increase in the lattice parameter was found, and a reduction in the band-gap was also found by optical absorption measurements. Both result as a function of the thermal annealing. On the other hand, conductivity versus temperature data show that a large defect quantity, at intermediate temperatures (200-300 degrees C) of the above indicated range, was created. The variable range hopping model of Mon was satisfied for these latter samples, indicating a characteristic hopping conduction of carriers through deep levels. (C) 1998 Elsevier Science Ltd.
引用
收藏
页码:1393 / 1398
页数:6
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