共 29 条
- [1] A modified dynamical model of drying process of polymer blend solution coated on a flat substrate PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2, 2008, 7028
- [2] Applying the dynamical model of drying process of a polymer solution coated on a flat substrate to effects of bumpy substrate NANOENGINEERING: FABRICATION, PROPERTIES, OPTICS, AND DEVICES VII, 2010, 7764
- [4] Impact of the Marangoni effect on the polymer thin film thickness profile after drying polymer solution coated on a flat substrate NANOENGINEERING: FABRICATION, PROPERTIES, OPTICS, AND DEVICES X, 2013, 8816
- [5] A dynamical model of drying process of a polymer solution having plural solvents and plural solutes (polymers) coated on a flat substrate for a flat and homogeneous polymer film fabrication PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 2, 2011, 8 (02): : 586 - 588
- [6] Nonlinear dynamics that appears in the dynamical model of drying process of a polymer solution coated on a flat substrate - art. no. 641704 Complexity and Nonlinear Dynamics, 2007, 6417 : 41704 - 41704
- [7] A model of coating and drying process for the flat polymer film fabrication PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY IX, 2002, 4754 : 252 - 259
- [8] Verification of the modified model of drying process of a polymer liquid film on a flat substrate by experiment PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XII, PTS 1 AND 2, 2005, 5853 : 454 - 462
- [9] Characteristic three-dimensional structure of resist's distribution after drying a resist solution coated on a flat substrate: analysis using the extended dynamical model of the drying process ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI, 2009, 7273
- [10] Verification of the modified model of drying process of a polymer liquid film on a flat substrate by experiment (2) - through more accurate experiment PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII, PTS 1 AND 2, 2006, 6283