Two-photon sensitized recording materials for multilayer optical disk

被引：4

作者：

Akiba, M. ^{[1
]}

Goto-Takahashi, E. ^{[1
]}

Takizawa, H. ^{[1
]}

Sasaki, T. ^{[2
]}

Mochizuki, H. ^{[2
]}

Mikami, T. ^{[2
]}

Kitahara, T. ^{[2
]}

机构：

[1] FUJIFILM Corp, Synthet Organ Chem Lab, 577 Ushijima, Kaisei, Kanagawa 2588577, Japan

[2] FUJIFILM Corp, Recording Media Res Lab, Kanagawa 2500001, Japan

来源：

OPTICAL DATA STORAGE 2010 | 2010年 / 7730卷

关键词：

two-photon absorption; two-photon sensitization; fluorescent dye generation; fluorescent quencher generation; twenty-layer two-photon recording;

D O I：

10.1117/12.855795

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Two types of novel two-photon sensitized recording material writable at 405 nm and 522nm were developed. The fluorescent dye generation type (F-type) material consists of at least two-photon absorption dye (TPAD) and fluorescent dye precursor (FDP), which is non-fluorescent before two-photon recording and fluorescent after two-photon recording due to fluorescent dye generation. The fluorescence quench type (Q-type) material, on the other hand, consists of at least TPAD, fluorescent dye (FD) and fluorescent quencher precursor (QP), which is fluorescent before two-photon recording and the fluorescence intensity is reduced after two-photon recording at the recorded spot due to fluorescent quencher generation. Both types of material showed quadratic dependency of recording light intensity at 522 and 405 nm. A twenty-layer two-photon recording media was fabricated with the Q-type material, and two-photon recording and one-photon fluorescent signal readout was successfully conducted.

引用

页数：6

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