Surface Modifications of Organic Buffer Layer/Inorganic Dielectric in Zinc Oxide Transistors

被引:0
|
作者
Yang, Jin-Woo [1 ]
Kim, Jun-Ho [1 ]
Lee, Ho-Won [1 ]
Hyung, Gun-Woo [2 ]
Kim, Young Kwan [1 ]
机构
[1] Hongik Univ, Dept Informat Display, Seoul 121791, South Korea
[2] Hongik Univ, Dept Mat Sci & Engn, Seoul 121791, South Korea
关键词
D O I
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the fabrication of top-contact ZnO field-effect transistors (FETs) with organic buffer dielectric on the inorganic dielectric. In flexible electronics, most inorganic semiconductors and dielectrics, including amorphous silicon, may be inc mantle with temperatur-sensitive plastic substrate.s. While organic semiconductots and organic dielectrics may seem well suited to this particular application niche. Therefore, ht this paper, we show Dud ZnO-FETs using proven inorganic semiconductor such as ZnO with organic frail& dielectric is a promising candidate of the flexible displays for flexible electronics, because ZnO-FETs can be Jbbricated at CPVA buffer dielectric layer with mobility fo 0.34 cm//Vs) and on/off current ratio (> 4x10(6)) at below 120 degrees C
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页码:1260 / +
页数:2
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