Image and color recognition using amorphous silicon p-i-n photodiodes

被引:15
|
作者
Louro, P
Vieira, M
Fantoni, A
Fernandes, M
de Carvalho, CN
Lavareda, G
机构
[1] ISEL, DEETC, P-1900014 Lisbon, Portugal
[2] IST, C1, P-1049001 Lisbon, Portugal
[3] Univ Nova Lisboa, DCM, FCT, P-2829516 Caparica, Portugal
关键词
photodiode; image sensor; color detection;
D O I
10.1016/j.sna.2005.03.050
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Large area hydrogenated amorphous silicon single and stacked p-i-n structures with low conductivity doped layers are proposed as monochrome and color image sensors. The layers of the structures are based on amorphous silicon alloys (a-Si(x)C(1-x):H). The current-voltage characteristics and the spectral sensitivity under different bias conditions are analyzed. The output characteristics are evaluated under different read-out voltages and scanner wavelengths. To extract information on image shape, intensity and color, a modulated light beam scans the sensor active area at three appropriate bias voltages and the photoresponse in each scanning position ("sub-pixel") is recorded. The investigation of the sensor output under different scanner wavelengths and varying electrical bias reveals that the response can be tuned, thus enabling color separation. The operation of the sensor is exemplified and supported by a numerical simulation. (C) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:326 / 330
页数:5
相关论文
共 50 条
  • [1] Low-temperature amorphous silicon p-i-n photodiodes
    Street, Robert A.
    Wong, William S.
    Lujan, Rene
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2009, 246 (08): : 1854 - 1857
  • [2] SILICON p-i-n PHOTODIODES.
    Todokoro, Yoshihiro
    Iwasa, Hitoo
    National Technical Report (Matsushita Electric Industry Company), 1976, 22 (01): : 19 - 28
  • [3] SEMICONDUCTOR SILICON PHOTODIODES WITH A P-I-N STRUCTURE
    KONDRATENKOV, YB
    KONDRATE.LM
    MEDVEDEV, MN
    PRIBORY I TEKHNIKA EKSPERIMENTA, 1973, (03): : 85 - 87
  • [4] Large area single and stacked p-i-n photodiodes as a color image sensors
    Louro, P
    Fernandes, M
    Fantoni, A
    Maçarico, A
    de Carvalho, CN
    Lavareda, G
    Vieira, M
    SILICON CARBIDE 2004-MATERIALS, PROCESSING AND DEVICES, 2004, 815 : 311 - 316
  • [5] LAG PROPERTIES OF SILICON p-i-n PHOTODIODES.
    Trishenkov, M.A.
    Khakuashev, P.Ye.
    Radio Engineering and Electronic Physics (English translation of Radiotekhnika i Elektronika), 1984, 29 (07): : 131 - 140
  • [6] Effects of radiation damage in silicon p-i-n photodiodes
    McPherson, M
    Jones, BK
    Sloan, T
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1997, 12 (10) : 1187 - 1194
  • [7] Modeling of transient and steady-state dark current in amorphous silicon p-i-n photodiodes
    Mahmood, S. A.
    Kabir, M. Z.
    CURRENT APPLIED PHYSICS, 2009, 9 (06) : 1393 - 1396
  • [8] THIN SILICON ION-IMPLANTED P-I-N PHOTODIODES
    PLUMB, RG
    CARROLL, JE
    IEE JOURNAL ON SOLID-STATE AND ELECTRON DEVICES, 1977, 1 (03): : 89 - 91
  • [9] Analog readout image sensor based on p-i-n hydrogenated amorphous silicon
    Vieira, M
    Fernandes, M
    Louro, P
    Martins, J
    Maçarico, A
    Schwarz, R
    Schubert, M
    VACUUM, 2002, 64 (3-4) : 249 - 254
  • [10] Diffusion of phosphorus in technology for manufacturing silicon p-i-n photodiodes
    Kukurudziak, M. S.
    SEMICONDUCTOR PHYSICS QUANTUM ELECTRONICS & OPTOELECTRONICS, 2022, 25 (04) : 385 - 393