State-specific enhancement of Cl+ and Cl- desorption for SiCl4 adsorbed on a Si(100) surface following Cl 2p and Si 2p core-level excitations

State-specific desorption for SiCl4 adsorbed on a Si(100) surface at similar to 90 K with variable coverage following the Cl 2p and Si 2p core-level excitations has been investigated using synchrotron radiation. The Cl+ yields show a significant enhancement following the Cl 2p --> 8a(1)* excitation. The Cl- yields are notably enhanced at the 8a(1)* resonance at both Cl 2p and Si 2p edges. The enhancement of the Cl yield occurs through the formation of highly excited states of the adsorbed molecules. These results provide some new dissociation processes from adsorbates on surfaces via core-level excitation.