Very heavily electron-doped CrSi2 as a high-performance high-temperature thermoelectric material

被引:31
|
作者
Parker, David [1 ]
Singh, David J. [1 ]
机构
[1] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA
来源
NEW JOURNAL OF PHYSICS | 2012年 / 14卷
关键词
CR ION-IMPLANTATION; SINGLE-CRYSTALS; TRANSPORT PERFORMANCES; DISILICIDES; SI;
D O I
10.1088/1367-2630/14/3/033045
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We analyze the thermoelectric behavior, using first principles and Boltzmann transport calculations, of very heavily electron-doped CrSi2 and find that at temperatures of 900-1250K and electron dopings of 1-4x10(21) cm(-3), thermopowers as large in magnitude as 200 mu VK-1 may be found. Such high thermopowers at such high carrier concentrations are extremely rare, and suggest that excellent thermoelectric performance may be found in these ranges of temperature and doping.
引用
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页数:10
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