Smooth and ultra-precise silicon nanowires fabricated by conventional optical lithography

被引：0

作者：

Palmer, R. ^{[1
]}

Alloatti, L. ^{[1
]}

Korn, D. ^{[1
]}

Moosmann, M. ^{[2
,3
]}

Huska, K. ^{[4
]}

Lemmer, U. ^{[4
]}

Gerthsen, D. ^{[5
]}

Schimmel, Th. ^{[2
,3
]}

Freude, W. ^{[1
]}

Koos, C. ^{[1
]}

Leuthold, J. ^{[1
]}

机构：

[1] Karlsruhe Inst Technol, Inst Photon & Quantum Elect, Engesserstr 5, D-76131 Karlsruhe, Germany

[2] KIT, Inst Nanotechnol, Karlsruhe, Germany

[3] KIT, Inst Phys Appl, Karlsruhe, Germany

[4] KIT, Light Technol Inst, Karlsruhe, Germany

[5] KIT, Lab Elect Microscopy, Karlsruhe, Germany

来源：

2011 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2011年

关键词：

WAVE-GUIDES;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate that nanowire waveguides with nanoscale precision and ultra-smooth sidewalls can be fabricated with conventional optical lithography. The presented fabrication scheme exploits the combination of a special staggered lithographic design and preferential wet etching.

引用

页数：2

共 47 条

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