A Novel Nanofabrication Damascene Lift-Off Technique

被引：1
|
作者：
Maraghechi, P. [1 ]
Cadien, K. [2 ]
Elezzabi, A. Y. [1 ]
机构：
[1] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada
[2] Univ Alberta, Dept Chem & Mat Engn, Edmonton, AB T6G 2G6, Canada
来源：
IEEE TRANSACTIONS ON NANOTECHNOLOGY | 2011年 / 10卷 / 04期
基金：
加拿大自然科学与工程研究理事会;
关键词：
Edge roughness; lift-off process; lithography; nanofabrication; ROUGHNESS;
D O I：
10.1109/TNANO.2010.2081374
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We introduce a new lift-off technique, which, compared to the conventional lift-off process, has both high yield (. 90%) and high reproducibility (. 95%). It has been shown that by etching after pattern transfer and prior to material deposition, the adhesion of the deposited material to the substrate is improved and roughness of feature edges is eliminated. This procedure is tailored to meet fabrication reproducibility criteria for nanoscale as well as microscale features.
引用
收藏
页码：822 / 826
页数：5
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