Laterally scaled Si-Si0.7Ge0.3 n-MODFETs with fmax>200 GHz and low operating bias

被引:9
|
作者
Koester, SJ [1 ]
Saenger, KL [1 ]
Chu, JO [1 ]
Ouyang, QC [1 ]
Ott, JA [1 ]
Jenkins, KA [1 ]
Canaperi, DF [1 ]
Tornello, JA [1 ]
Jahnes, CV [1 ]
Steen, SE [1 ]
机构
[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
high mobility; MODFET; silicon germanium;
D O I
10.1109/LED.2005.843222
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the dc and RF characterization of laterally scaled, Si-SiGe n-MODFETs. Devices with gate length, L-g, of 80 rum had f(T) = 79 GHz and f(max) = 212 GHz, while devices with L-g = 70 nm had f(T) as high as 92 GHz. The MODFETs displayed enhanced fT at reduced drain-to-source voltage, V-ds, Compared to Si MOSFETs with similar fT at high V-ds.
引用
收藏
页码:178 / 180
页数:3
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