Interface instability in the drawing process of copper/tantalum conductors

被引:33
|
作者
Thilly, L
Colin, J
Lecouturier, F
Peyrade, JP
Grilhé, J
Askénazy, S
机构
[1] UPS, INSA, CNRS, Serv Natl Champs Magnet, F-31062 Toulouse, France
[2] UPS, INSA, CNRS, Phys Mat Condensee Lab, F-31077 Toulouse, France
[3] SP2MI, Met Phys Lab, F-86960 Futuroscope, France
关键词
cold working; composites; surfaces & interfaces; roughness;
D O I
10.1016/S1359-6454(98)00418-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Copper/tantalum test billets have been cold drawn, using the process developed for the elaboration of copper/niobium multifilamentary conductors, for the development of high strength and high conductivity conductors for high pulsed magnetic fields. After a section reduction of 60%, a macroscopic roughness of the tantalum surface has been observed: two sets of perpendicular undulations developed (pa;allel and perpendicular to the drawing axis), with wavelengths in the 100 mu m range. This phenomenon, observed for the first time on bulk materials, is interpreted in terms of the Grinfeld instability: the associated wavelength, calculated in the case of a shear stress discontinuity at the interface between b.c.c. tantalum and f.c.c. copper, is found in the right magnitude range. (C) 1999 Acta Metallurgica Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:853 / 857
页数:5
相关论文
共 50 条
  • [1] Axial and radial interface instabilities of copper/tantalum cylindrical conductors
    Colin, J
    Thilly, L
    Lecouturier, F
    Peyrade, JP
    Askénazy, S
    Grilhé, J
    ACTA MATERIALIA, 1999, 47 (09) : 2761 - 2768
  • [2] Electrodeposition of copper as a route for tantalum drawing
    Robin, A
    de Souza, KA
    Rosa, JL
    Silva, MB
    SURFACE ENGINEERING, 2002, 18 (02) : 120 - 125
  • [3] INSTABILITY IN BUBBLE DRAWING PROCESS
    ANDEEN, GB
    TIMM, RF
    MECHANICAL ENGINEERING, 1973, 95 (02) : 52 - 52
  • [4] Effect of Process Parameters on Instability and Drawing Accuracy in Aluminum Rectangular Tube Drawing Process
    Xu, Wu Jiao
    Wang, Kai Qing
    Zhou, Jie
    ADVANCED SCIENCE LETTERS, 2011, 4 (6-7) : 1966 - 1970
  • [5] The limiting drawing ratio for plastic instability of the cup-drawing process
    Leu, DK
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 1999, 86 (1-3) : 168 - 176
  • [6] Electromigration-Induced Instability of the Interface between Solid Conductors
    R. V. Goldstein
    T. M. Makhviladze
    M. E. Sarychev
    Physical Mesomechanics, 2018, 21 : 275 - 282
  • [7] Electromigration-Induced Instability of the Interface between Solid Conductors
    Goldstein, R., V
    Makhviladze, T. M.
    Sarychev, M. E.
    PHYSICAL MESOMECHANICS, 2018, 21 (04) : 275 - 282
  • [8] Characterization of the copper/electrolyte interface on two copper conductors under high voltage
    Jebnoun, S.
    Sutter, E. M. M.
    Tran, M.
    Tribollet, B.
    CORROSION SCIENCE, 2008, 50 (09) : 2732 - 2738
  • [9] RUPTURE INSTABILITY IN HYDROFORMING DEEP-DRAWING PROCESS
    YOSSIFON, S
    TIROSH, J
    INTERNATIONAL JOURNAL OF MECHANICAL SCIENCES, 1985, 27 (09) : 559 - 570
  • [10] Criteria for the process of drawing copper microwire for electronics
    Volkov, A. V.
    Sokolova, I. D.
    Korzhavyi, A. P.
    Beckel, L. S.
    INTERNATIONAL WORKSHOP ADVANCED TECHNOLOGIES IN MATERIAL SCIENCE, MECHANICAL AND AUTOMATION ENGINEERING - MIP: ENGINEERING - 2019, 2019, 537