Effect of zirconium addition on formation of CoSi2 thin films

被引：0
|
作者：
Cheng, FX [1 ]
Jiang, CH [1 ]
Dong, XP [1 ]
Wu, HF [1 ]
Wu, JS [1 ]
机构：
[1] Shanghai Jiao Tong Univ, Key lab High Temp Mat & Tests, Minist Educ, Sch Mat Sci & Engn, Shanghai 200030, Peoples R China
来源：
JOURNAL OF MATERIALS SCIENCE | 2005年 / 40卷 / 21期
基金：
中国国家自然科学基金;
关键词：
D O I：
10.1007/s10853-005-1361-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
CoSi2 thin films were prepared by annealing the amorphous Co-Si thin films. Zr was added into the amorphous thin film in order to investigate its effect on formation of CoSi2 thin film. It was found that Zr increased the crystallization nucleation barrier and accelerated the complete transformation of CoSi to CoSi2. (c) 2005 Springer Science+ Business Media, Inc.
引用
收藏
页码：5655 / 5658
页数：4
相关论文
共 50 条
  • [1] Effect of zirconium addition on formation of CoSi2 thin films
    Fanxiong Cheng
    Chuanhai Jiang
    Xianping Dong
    Haifeng Wu
    Jiansheng Wu
    Journal of Materials Science, 2005, 40 : 5655 - 5658
  • [2] FORMATION OF THIN-FILMS OF COSI2 ON GAAS
    HULT, M
    PERSSON, L
    ELBOUANANI, M
    ANDERSSON, M
    OSTLING, M
    LUNDBERG, N
    ZARING, C
    GEORGSSON, K
    COHEN, DD
    DYTLEWSKI, N
    JOHNSTON, PN
    WALKER, SR
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (06) : 2435 - 2443
  • [3] Formation of thin films of monocrystalline CoSi2 on (100) Si
    Maex, K.
    Brijs, G.
    Vanhellemont, J.
    Vandervorst, W.
    Nuclear Instruments & Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1991, 59-60 (pt 1):
  • [4] FORMATION OF THIN-FILMS OF COSI2 - NUCLEATION AND DIFFUSION MECHANISMS
    DHEURLE, FM
    PETERSSON, CS
    THIN SOLID FILMS, 1985, 128 (3-4) : 283 - 297
  • [5] FORMATION OF THIN-FILMS OF MONOCRYSTALLINE COSI2 ON (100) SI
    MAEX, K
    BRIJS, G
    VANHELLEMONT, J
    VANDERVORST, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 : 660 - 665
  • [6] Effect of CoSi2 interfacial layer on the magnetic properties of Si|CoSi2|Sm-Co thin films
    Saravanan, P.
    Boominathasellarajan, S.
    Sobel, Bartlomiej
    Waclawek, Stanislaw
    Vinod, V. T. P.
    Cernik, Miroslav
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2020, 493
  • [7] EFFECT OF STRESS ON THE SUPERCONDUCTING PROPERTIES OF COSI2 THIN-FILMS
    BRIGGS, A
    CHROBOCZEK, J
    DAVITAYA, FA
    BADOZ, PA
    THIN SOLID FILMS, 1989, 174 : 285 - 288
  • [8] Effect of annealing on CoSi2 thin films prepared by magnetron sputtering
    Cheng, FX
    Jiang, CH
    Wu, JS
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2005, 119 (01): : 61 - 64
  • [9] VERY THIN COSI2 FILMS BY CO SPUTTERING
    MASZARA, WP
    APPLIED PHYSICS LETTERS, 1993, 62 (09) : 961 - 963
  • [10] CONTROL OF PINHOLE FORMATION IN EPITAXIAL COSI2 FILMS
    HUNT, BD
    LEWIS, N
    HALL, EL
    ROBERTSON, CD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (03): : 749 - 750
12345