High Energy-High Repetition Rate Fiber Laser System for Precision Micromachining with Fundamental and Second Harmonic Wavelengths

被引:4
|
作者
Yoshino, Fumiyo [1 ]
Bovatsek, James [1 ]
Arai, Alan [1 ]
Uehara, Yuzuru [2 ]
Liu, Zhenlin [2 ]
Cho, Gyu [2 ]
机构
[1] IMRA Amer Inc, Applicat Res Lab, Fremont, CA 94538 USA
[2] IMRA Amer Inc, Ann Arbor, MI 48105 USA
来源
关键词
femtosecond; ultrafast; micromachining; silicon; sapphire; glass; laser scribing;
D O I
10.2961/jlmn.2006.03.0021
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Interest in femtosecond laser micromachining has been growing for applications that require precise material removal or modification over very small features. Flat panel display manufacturing, lithography mask repair, semiconductor wafer scribing and optical waveguide writing are some examples where femtosecond pulse lasers are being studied. IMRA's latest experimental prototype FCPA is based on components similar to the production FCPA mu Jewel D-400. The latest design concept produces 10-mu J pulses at a repetition rate of up to 100 kHz or 1-mu J pulses at 1 MHz using Yb-doped fiber amplifier technology. Frequency-doubling produces 522-nm wavelength output with pulse energies up to 4 mu J. The higher pulse energy, relatively high repetition rate, availability of efficient frequency-doubling with a compact, reliable design will enable additional industrial applications. This paper describes the experimental results comparing the nonlinear optical loss through different types of transparent materials. The combination of the nonlinear absorption initiated by the ultrashort pulses and the heat accumulation from the high repetition rate enable some unique advantages over other lasers. The effect of the two different wavelengths (1045 nm and 522 nm) on processing of transparent materials is illustrated in several examples.
引用
收藏
页码:258 / 263
页数:6
相关论文
共 50 条
  • [1] Micromachining with a High Repetition Rate Femtosecond Fiber Laser
    Yoshino, Fumiyo
    Shah, Lawrence
    Fermann, Martin
    Arai, Alan
    Uehara, Yuzuru
    JOURNAL OF LASER MICRO NANOENGINEERING, 2008, 3 (03): : 157 - 162
  • [2] High-repetition rate excimer laser for micromachining
    Herbst, L
    Klaft, I
    Wenzel, T
    Rebhan, U
    GAS AND CHEMICAL LASERS AND INTENSE BEAM APPLICATIONS IV, 2003, 4971 : 87 - 95
  • [3] Micromachining with high repetition rate femtosecond laser sources
    Baubeau, E
    Le Harzic, R
    Jonin, C
    Audouard, E
    Mottin, S
    Courbon, M
    Laporte, P
    1ST INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2000, 4088 : 48 - 50
  • [4] High power fiber laser system for a high repetition rate laserwire
    Nevay, L. J.
    Walczak, R.
    Corner, L.
    PHYSICAL REVIEW SPECIAL TOPICS-ACCELERATORS AND BEAMS, 2014, 17 (07):
  • [5] High repetition rate, high energy fiber CPA system for material processing
    Schreiber, T
    Röser, F
    Limpert, J
    Liem, A
    Höfer, S
    Zellmer, H
    Will, M
    Nolte, S
    Tünnermann, A
    2005 CONFERENCE ON LASERS & ELECTRO-OPTICS (CLEO), VOLS 1-3, 2005, : 2191 - 2193
  • [6] Low repetition rate high energy 1.5 μm fiber laser
    Wan, Peng
    Liu, Jian
    Yang, Lih-Mei
    Amzajerdian, Farzin
    OPTICS EXPRESS, 2011, 19 (19): : 18067 - 18071
  • [7] Pulsed shaping high energy fiber laser at low repetition rate
    Wan, Peng
    Liu, Jian
    Yang, Lih-Mei
    Amzajerdian, Farzin
    NANOPHOTONICS AND MACROPHOTONICS FOR SPACE ENVIRONMENTS V, 2011, 8164
  • [8] Compact all-fiber ring femtosecond laser with high fundamental repetition rate
    Wei, Xiaoming
    Xu, Shanhui
    Huang, Huichang
    Peng, Mingying
    Yang, Zhongmin
    OPTICS EXPRESS, 2012, 20 (22): : 24607 - 24613
  • [9] Millijoule Pulse Energy High Repetition Rate Femtosecond Fiber CPA System: Results, Micromachining Application and Scaling Potential
    Roeser, F.
    Rothhardt, J.
    Eidam, T.
    Schmidt, O.
    Schimpf, D. N.
    Ancona, A.
    Nolte, S.
    Limpert, J.
    Tuennermann, A.
    ULTRAFAST PHENOMENA XVI, 2009, 92 : 744 - 746
  • [10] HIGH REPETITION RATE LASER SYSTEM
    HASWELL, WT
    HITT, JS
    FELDMAN, JM
    PROCEEDINGS OF THE IEEE, 1964, 52 (01) : 93 - &