Study of freeform lens for UV-LEDs exposure system with reflector for uniform irradiance

被引：0

作者：

Chen, Y. C. ^{[1
]}

Pan, C. T. ^{[1
]}

Yang, T. L. ^{[1
]}

Ju, S. P. ^{[1
]}

Lin, Y. R. ^{[1
]}

Wu, I. C. ^{[1
]}

机构：

[1] Natl Sun Yat Sen Univ, Ctr Nanosci & Nanotechnol, Dept Mech & Electromech Engn, Kaohsiung 80424, Taiwan

来源：

2015 IEEE 10TH INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS (NEMS) | 2015年

关键词：

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this study, UV-LED (ultraviolet light emitting diode) is developed for photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of freeform lens with reflector coated on the light source element of UV-LED for exposure systems. Based on the law of conservation of energy and Snell's law method, a free-form lens is designed in the study. The optical distribution intensity of the freeform lens with reflector layer was determined by using commercial optical simulation FRED software. The experimental results show that the average irradiance and uniformity on the target plane with 60 degree reflector layer were 8.7mW/cm(2) and 86.9%, respectively. The irradiance and uniformity were higher than that of freeform lens without reflector, 7.8mW/cm(2) and 87%, respectively. Therefore, the results show that the freeform lens with reflector was demonstrated to obtain 97.5% average normalized cross correlation (NCC) between the simulation and experimental measurement of UV-LEDs exposure system. Through this design of reflection of UV-LED light source, the intensity and uniformity can be enhanced significantly.

引用

页码：623 / 624

页数：2

共 19 条

[1] Design of freeform lens with TFMG reflector for UV-LEDs lithography system
Pan, C. T.
Yang, T. L.
Chen, Y. C.
Chang, C. M.
Hsu, J. H.
Huang, J. C.
OPTIK, 2016, 127 (17): : 6850 - 6857
[2] A novel application of UV-LEDs in the contact lens manufacturing process
McDermott, S
Walsh, JE
Howard, RG
Opto-Ireland 2005: Optical Sensing and Spectroscopy, 2005, 5826 : 119 - 130
[3] Freeform Optics Design of Primary Lens for Uniform Irradiance Distribution of Concentrator Photovoltaic System
Pham Thanh Tuan
Duy, N. N.
Vu Ngoc Hai
Shin, Seoyong
CURRENT DEVELOPMENTS IN LENS DESIGN AND OPTICAL ENGINEERING XX, 2019, 11104
[4] Lens of controllable optical field with thin film metallic glasses for UV-LEDs
Pan, C. T.
Chen, Y. C.
Lin, Po-Hung
Hsieh, C. C.
Hsu, F. T.
Lin, Po-Hsun
Chang, C. M.
Hsu, J. H.
Huang, J. C.
OPTICS EXPRESS, 2014, 22 (12): : 14411 - 14424
[5] Quantitative Evaluation of Light Collimating for Commercial UV-LEDs Based on Analytic Collimating Lens
Syu, Yong-Sin
Lee, Yung-Chun
APPLIED SCIENCES-BASEL, 2022, 12 (02):
[6] Investigation of uniformity field generated from freeform lens with UV LED exposure system
Ciou, F. Y.
Chen, Y. C.
Pan, C. T.
Lin, P. H.
Lin, P. H.
Hsu, F. T.
LIGHT-EMITTING DIODES: MATERIALS, DEVICES, AND APPLICATIONS FOR SOLID STATE LIGHTING XIX, 2015, 9383
[7] Study on photoluminescence of GaN-based UV-LEDs with refractive index gradient polymeric nanopatterns
Park, Manshik
Yu, Guiduk
Shin, Kyusoon
JOURNAL OF CRYSTAL GROWTH, 2011, 326 (01) : 28 - 32
[8] Freeform reflector design for uniform illumination in a space-based remote sensor calibration system
Tian, Jiewen
Ye, Xin
Fang, Wei
APPLIED OPTICS, 2022, 61 (16) : 4678 - 4686
[9] Spherical-freeform lens design for uniform illumination based on differentiable ray tracing with 'uv' polynomials
Li, Haoran
Tang, Haisong
Feng, Zexin
Luo, Yi
Wang, Yongtian
OPTICAL DESIGN AND TESTING XIII, 2023, 12765
[10] 3D Microlithography Using an Integrated System of 5-mm UV-LEDs with a Tilt-Rotational Sample Holder
Shiba, Sabera Fahmida
Jeon, Hyeongmin
Kim, Jong-Soo
Kim, Jong-Eun
Kim, Jungkwun
MICROMACHINES, 2020, 11 (02)

← 1 2 →