Switching Dynamics of Ag-Based Filamentary Volatile Resistive Switching Devices-Part II: Mechanism and Modeling

被引:37
|
作者
Wang, Wei [1 ]
Covi, Erika [1 ]
Lin, Yu-Hsuan [2 ]
Ambrosi, Elia [1 ]
Milozzi, Alessandro [1 ]
Sbandati, Caterina [1 ]
Farronato, Matteo [1 ]
Ielmini, Daniele [1 ]
机构
[1] Politecn Milan, Dipartimento Elettron Informaz & Bioingn, I-20133 Milan, Italy
[2] Natl Chiao Tung Univ, Inst Elect, Dept Elect Engn, Hsinchu 30010, Taiwan
关键词
Switches; Threshold voltage; Data models; Voltage control; Electrodes; Mathematical model; Ions; Einstein relation; ionic drift; surface diffusion; volatile memory; REAL-TIME OBSERVATION; MIGRATION;
D O I
10.1109/TED.2021.3095033
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Understanding the switching mechanism of the volatile resistive switching random access memory (RRAM) device is important to harness its characteristics and further enhance its performance. Accurate modeling of its dynamic behavior is also of deep value for its applications both as selector and as short-term memory synapse for future neuromorphic applications operating in temporal domain. In this work, we investigate the switching and retention (relaxation) processes of the Ag-based metallic filamentary volatile resistive switching devices. We find that the switching process can be modeled by the ionic drift under electric field, while the retention process can be modeled by the ionic diffusion along the filament surface driven by the gradient of surface atomic concentration. Through further theoretical analysis, we also find that the ionic drift and ionic diffusion can be unified within the general Einstein relation. To confirm this relation, we collect ionic mobility and diffusivity data from the literature using the switching and retention model. Finally, we show that the read voltage dependent retention time can be explained by the competition between the ionic drift and diffusion flux.
引用
收藏
页码:4342 / 4349
页数:8
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