Properties of MBE growth InN:Cr films

被引:0
|
作者
Chen, P. P. [1 ]
Lu, W. [1 ]
Makino, H. [2 ]
Yao, T. [2 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
[2] Tohoku Univ, Ctr Interdisciplinary Res, Sendai, Miyagi 980, Japan
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
InN:Cr films were prepared at Al2O3 substrate by low temperature (300 degrees C) molecular beam epitaxy (mBE). The InN:Cr films show clear ferromagnetic properties up to 350K. The electronic structure of the InN:Cr film has been studied by photoemission spectroscopy.
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页码:487 / 487
页数:1
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