Electron Beam Focusing Features in a Plasma Electron Source under Forevacuum Pressures

被引：7
|
作者：
Zenin, A. A. [1 ]
Bakeev, I. Yu. [1 ]
Burachevskii, Yu. A. [1 ]
Klimov, A. S. [1 ]
Oks, E. M. [1 ]
机构：
[1] Tomsk State Univ Control Syst & Radioelect, Tomsk 634050, Russia
来源：
TECHNICAL PHYSICS LETTERS | 2016年 / 42卷 / 07期
基金：
俄罗斯基础研究基金会;
关键词：
GENERATION; EMITTER; SYSTEM; GUN;
D O I：
10.1134/S1063785016070142
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Features of focusing electron beams generated by a forevacuum plasma source under pressures of 10-30 Pa are investigated and the principle possibility of obtaining submillimeter beams is demonstrated. A beam power density of 10(5) W/cm(2) is reached at an electron beam diameter of 0.6 mm. The obtained beam parameters offer opportunities for precision electron beam processing of dielectric materials, including high-temperature alumina ceramics.
引用
收藏
页码：712 / 714
页数：3
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