Photoluminescence Enhancement by Band Alignment Engineering In MoS2/FePS3 van der Waals Heterostructures

被引:22
|
作者
Ramos, Maria [1 ]
Marques-Moros, Francisco [2 ]
Esteras, Dorye L. [2 ]
Manas-Valero, Samuel [2 ]
iquez-Guerra, Eudomar Henr [3 ]
Jose, Marcos Gadea [3 ]
Baldovi, Jose J. [2 ]
Canet-Ferrer, Josep [2 ]
Coronado, Eugenio [2 ]
Calvo, M. Reyes [3 ]
机构
[1] Univ Alicante, Dept Fis Aplicada, Alicante 03690, Spain
[2] Univ Vale`ncia, Institutode Ciencia Mol ICMol, Paterna 46980, Spain
[3] Univ Alicante, Inst Univ Mat Alicante IUMA, Dept Fis Aplicada, Alicante 03690, Alicante, Spain
关键词
van der Waals heterostructures; transition metal dichalcogenide monolayers; enhanced photoluminescence; band alignment engineering; optoelectronic tunability; MOS2;
D O I
10.1021/acsami.2c05464
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Single-layer semiconducting transition metal dichalcogenides (2H-TMDs) display robust excitonic photoluminescence emission, which can be improved by controlled changes to t h e environment and the chemical potential of the material. Howe v e r , a drastic emission quench has been generally observed when TMDs are stacked in van der Waals heterostructures, which often favor t h e nonradiative recombination of photocarriers. Herein, we achieve an enhancement of the photoluminescence of single-layer MoS2 on top of van der Waals FePS3. The optimal energy band alignment of this heterostructure preserves light emission of MoS(2 )against nonradiative interlayer recombination processes and favors the charge transfer from MoS2, an n-type semiconductor, to FePS3, a p-type narrow-gap semiconductor. The strong depletion of carriers in the MoS2 layer is evidenced by a dramatic increase in the spectral weight of neutral excitons, which is strongly modulated by the thickness of the FePS3 underneath, leading to the increase of photoluminescence intensity. The present results demonstrate the potential for the rational design of van der Waals heterostructures with advanced optoelectronic properties.
引用
收藏
页码:33482 / 33490
页数:9
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