Dielectric properties of soft chemical method derived CaCu3Ti4O12 thin films onto Pt/TiO2/Si(100) substrates

被引:24
|
作者
Moura, F. [2 ]
Aguiar, E. C. [3 ]
Longo, E. [3 ]
Varela, J. A. [3 ]
Simoes, A. Z. [1 ]
机构
[1] Univ Estadual Paulista Unesp, Fac Engn Guaratingueta, BR-12516410 Sao Paulo, Brazil
[2] Univ Fed Itajuba Unifei, BR-3590037 Itabira, MG, Brazil
[3] Univ Estadual Paulista, Inst Quim, Lab Interdisciplinar Ceram, BR-14801907 Sao Paulo, Brazil
基金
巴西圣保罗研究基金会;
关键词
Thin films; Dielectrics; Chemical synthesis; X-ray diffraction; ELECTRICAL-PROPERTIES; CONSTANT MATERIAL; BEHAVIOR; DEPOSITION; IONS; CU;
D O I
10.1016/j.jallcom.2010.12.184
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Calcium copper titanate, CaCu3Ti4O12 (CCTO), thin film has been deposited by the soft chemical method on Pt/Ti/SiO2/Si (1 0 0) substrates at 700 degrees C for 2 h. The peaks were indexed as cubic phase belonging to the Im-3 space group. The film exhibited a duplex microstructure consisting of large grains of 130 nm in length and regions of fine grains (less than 80 nm). The CCTO film capacitor showed a dielectric loss of 0.031 and a dielectric permittivity of 1020 at 1 MHz. The J-V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms. Based on impedance analyses, the equivalent circuit of CCTO film consisting of a resistor connected in series with two resistor-capacitor (RC) elements. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:3817 / 3821
页数:5
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