Generation of periodic sawtooth optical intensity by phase-shifting mask

被引：1

作者：

Ura, Shogo ^{[1
]}

Kintaka, Kenji ^{[2
]}

Awazu, Hideyuki ^{[1
]}

Nishio, Kenzo ^{[1
]}

Awatsuji, Yasuhiro ^{[1
]}

Nishii, Junji ^{[3
]}

机构：

[1] Kyoto Inst Technol, Dept Elect, Grad Sch Sci & Technol, Kyoto 6068585, Japan

[2] Natl Inst Adv Ind Sci & Technol, Photon Res Inst, Tsukuba, Ibaraki 3058568, Japan

[3] Natl Inst Adv Ind Sci & Technol, Photon Res Inst, Osaka 5638577, Japan

来源：

APPLIED PHYSICS EXPRESS | 2008年 / 1卷 / 02期

关键词：

D O I：

10.1143/APEX.1.022005

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. Phase-shifting mask was designed with 244nm exposure-light wavelength to launch multiple diffraction beams so that resultant interference pattern fit to required optical intensity profile. Fine surface-relief pattern on SiO(2) mask for 3-mu m-period sawtooth optical-intensity profile was fabricated by electron-beam direct-writing lithography with 30nm scanning step and relief height of 65nm. Sawtooth-like intensity profile was demonstrated with theoretically predicted interference visibility. (c) 2008 The Japan Society of Applied Physics.

引用

页数：3

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