Spectroscopic investigations on silicon nitride deposition with the Plasmodul®

被引：2

作者：

Schulz, A ^{[1
]}

Feichtinger, J ^{[1
]}

Krüger, J ^{[1
]}

Walker, M ^{[1
]}

Schumacher, U ^{[1
]}

机构：

[1] Univ Stuttgart, Inst Plasmaforsch, D-70569 Stuttgart, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 174卷

关键词：

silicon nitride; mass spectrometry; plasma reactor;

D O I：

10.1016/S0257-8972(03)00535-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Investigations by emission light spectroscopy and mass spectrometry at gas mixture variations between the plasma compounds H-2, N-2, NH3 and SiH4 are presented to get information about the processes taking place in a silicon nitride deposition with the Plasmodul((R)) out of the monomers NH3 and SiH4. The Plasmodul((R)) is a microwave sustained low pressure plasma reactor with a modular concept based on the Duo-Plasmaline((R)) principle which provides an easy upscaling for industrial applications. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：947 / 951

页数：5

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