Electroacoustic conversion in modulation-doped SiGe/Si heterostructures

被引:0
|
作者
Khizhnyi, V. I. [1 ]
机构
[1] Natl Acad Sci Ukraine, A Ya Usikov Inst Radio Phys & Elect, UA-61085 Kharkov, Ukraine
关键词
D O I
10.1063/1.2832357
中图分类号
O59 [应用物理学];
学科分类号
摘要
The temperature dependence of the efficiency of linear generation of acoustic waves by electric fields in modulation-doped Si1-xGex/Si heterostructures is investigated by the method of high-frequency hybrid acoustic spectroscopy at a frequency of similar to 225 MHz. It is shown that the conversion signal in the temperature region 4.2-150 K is due to the presence of space-charge regions in the structure and the Coulomb mechanism of excitation of longitudinal acoustic waves by an electric field normal to the surface of the planar structure. The influence of the Ge concentration x in coherently strained SiGe layers on the amplitude of the conversion signal is investigated. It is found that the effect is highly sensitive to variation of the index x in the interval 0.1 < x < 0.13. The influence of possible piezoactivity of the SiGe layers on the value of the conversion signal is discussed, as well as the influence on it of charges in deep traps near the Si/SiGe/Si interfaces.
引用
收藏
页码:63 / 68
页数:6
相关论文
共 50 条
  • [1] Donor states in modulation-doped Si/SiGe heterostructures
    Blom, A
    Odnoblyudov, MA
    Yassievich, IN
    Chao, KA
    PHYSICAL REVIEW B, 2003, 68 (16)
  • [2] EXTREMELY HIGH-ELECTRON-MOBILITY IN SI/SIGE MODULATION-DOPED HETEROSTRUCTURES
    ISMAIL, K
    ARAFA, M
    SAENGER, KL
    CHU, JO
    MEYERSON, BS
    APPLIED PHYSICS LETTERS, 1995, 66 (09) : 1077 - 1079
  • [3] THERMAL ANNEALING OF MODULATION-DOPED SI/SIGE HETEROSTRUCTURES WITH HIGH ELECTRON MOBILITIES
    SCHAFFLER, F
    JORKE, H
    APPLIED PHYSICS LETTERS, 1991, 58 (04) : 397 - 399
  • [4] IDENTIFICATION OF A MOBILITY-LIMITING SCATTERING MECHANISM IN MODULATION-DOPED SI/SIGE HETEROSTRUCTURES
    ISMAIL, K
    LEGOUES, FK
    SAENGER, KL
    ARAFA, M
    CHU, JO
    MOONEY, PM
    MEYERSON, BS
    PHYSICAL REVIEW LETTERS, 1994, 73 (25) : 3447 - 3450
  • [5] Electron transport in Si/SiGe modulation-doped heterostructures using Monte Carlo simulation
    Monsef, F
    Dollfus, P
    Galdin-Retailleau, S
    Herzog, HJ
    Hackbarth, T
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (07) : 3587 - 3593
  • [6] Very high hole mobility in p-type Si/SiGe modulation-doped heterostructures
    Tsai, WC
    Chang, CY
    Huang, GW
    Fang, FF
    Chang, YH
    Huang, CF
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (3B): : L323 - L326
  • [7] Very high hole mobility in P-type Si/SiGe modulation-doped heterostructures
    Natl Chiao-Tung Univ, Hsin-Chu, Taiwan
    Jpn J Appl Phys Part 2 Letter, 3 B (L323-L326):
  • [8] Single-electron transistor based on modulation-doped SiGe heterostructures
    Notargiacomo, A
    Di Gaspare, L
    Scappucci, G
    Mariottini, G
    Evangelisti, F
    Giovine, E
    Leoni, R
    APPLIED PHYSICS LETTERS, 2003, 83 (02) : 302 - 304
  • [9] Integrated enhancement- and depletion-mode FET's in modulation-doped Si/SiGe heterostructures
    Ismail, K
    Chu, JO
    Arafa, M
    IEEE ELECTRON DEVICE LETTERS, 1997, 18 (09) : 435 - 437
  • [10] HIGH ELECTRON-MOBILITY IN MODULATION-DOPED SI/SIGE
    ISMAIL, K
    MEYERSON, BS
    WANG, PJ
    APPLIED PHYSICS LETTERS, 1991, 58 (19) : 2117 - 2119