PLANARITY-ENFORCING HIGHER-ORDER GRAPH CUT

被引:0
|
作者
Weibel, Thomas [1 ]
Daul, Christian [1 ]
Wolf, Didier [1 ]
Roesch, Ronald
机构
[1] Nancy Univ, CNRS, UMR 7039, CRAN, F-54516 Vandoeuvre Les Nancy, France
关键词
Higher order graph cut; image registration; stitching/mosaicing;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
When image primitives cannot be robustly extracted, the estimation of a perspective transformation between overlapping images can be formulated as a markov random field (MRF) and minimized efficiently using graph cuts. For well contrasted images with low noise level, a first order MRF leads to an accurate and robust registration. With increasing noise however, the registration quality decreases rapidly. This contribution presents a novel algorithm that enforces planarity (as required for perspective transformations) as a soft constraint by adding higher-order cliques to the energy formulation. Results show that for low levels of Gaussian noise (standard deviation sigma(n) epsilon [0, 4]), the algorithm performs comparably to the standard first order formulation. For increasing levels of noise (sigma(n) epsilon [5, 12]), the found solution is roughly twice as accurate (deviation of approximate to 2 pixels on average compared to approximate to 4 pixels for sigma(n) = 10).
引用
收藏
页码:41 / 44
页数:4
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