Power Benefit Study of Monolithic 3D IC at the 7nm Technology Node

被引:0
|
作者
Chang, Kyungwook [1 ]
Acharya, Kartik [1 ]
Sinha, Saurabh [2 ]
Cline, Brian [2 ]
Yeric, Greg [2 ]
Lim, Sung Kyu [1 ]
机构
[1] Georgia Inst Technol, Sch ECE, Atlanta, GA 30332 USA
[2] ARM Inc, Austin, TX USA
来源
2015 IEEE/ACM INTERNATIONAL SYMPOSIUM ON LOW POWER ELECTRONICS AND DESIGN (ISLPED) | 2015年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Monolithic 3D IC (M3D) is one potential technology to help with the challenges of continued circuit power and performance scaling. In this paper, for the first time, the power benefits of monolithic 3D IC (M3D) using a 7nm FinFET technology are investigated. The predictive 7nm Process Design Kit (PDK) and standard cell library for both high performance (HP) and low standby power (LSTP) device technologies are b iIt based on NanGate 45nm PDK using accurate dimensional, materIal, and electrical parameters from publications and a commercial-grade tool flow. In addition, we implement full-chip M3D GDS layouts using both 7nm HP and LSTP cells and industry-standard physical design tools, and evaluate the resulting full-chip power, performance, and area metrics. Our study first shows that 7nm HP M3D designs outperform 7nm HP 2D designs by 16.8% in terms of iso-performance total power reduction. Moreover, 7nm LSTP M3D designs reduce the total power consumption by 14.3% compared to their 2D counterparts. This convincingly demonstrates the power benefits of M3D technologies in both high performance as well as low power future generation devices.
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页码:201 / 206
页数:6
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