Magneto-resistance and I-V characteristic studies of AlSb and InSb thin film bilayer structure

被引:0
|
作者
Singh, M [1 ]
Vijay, YK [1 ]
机构
[1] Univ Rajasthan, Dept Phys, Jaipur 302004, Rajasthan, India
关键词
I-V characteristic; magneto resistance; inter-diffusion; Rutherford backscattering measurements; bilayer;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The I-V characteristic and magneto-resistance of Al-Sb and In-Sb thin films were measured with Cu electrode as the electrical contact. It was found that I-V characteristics are non-linear in nature and magneto-resistance decreases in case of Al-Sb and increases in case of In-Sb thin film bilayer structure. The Rutherford backscattering-measurements also indicate the inter-diffusion and the concentration varies with temperature.
引用
收藏
页码:383 / 385
页数:3
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