Determination of trace amounts of Cu, Ni, Ti and B in Fe-based alloys by radio-frequency-powered glow discharge optical emission spectrometry associated with bias-current conduction method

被引:0
|
作者
Fujimura, T
Yamamoto, A
Wagatsuma, K
机构
[1] JFE Steel Corp, Steel Res Lab, Fukuyama, Hiroshima 7218510, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
关键词
optical emission spectrometry; radio-frequency-powered glow discharge plasma; conduction of a d.c. bias current; self-bias voltage; detection limit;
D O I
暂无
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
In an r.f. glow-discharge plasma, a d.c. bias current can be introduced by connecting an electric circuit comprising a low-pass filter and a variable resistor. The bias current promotes the emission excitations in the plasma, leading to an improvement of the detection power in the optical emission spectrometry. By conducting a bias current of 27 mA, the emission intensities of atomic resonance lines were several times larger than those obtained with conventional r.f.-powered plasmas. The detection limits for determination of alloyed elements in Fe-based low alloyed standard samples were estimated to be 3 ppm Cu for Cu I 324.75 nm, 10 ppm Ni for Ni I 352.45nm, 6 ppm Ti for Ti I 364.267 nm, and 7 ppm B for B I 208.96 nm.
引用
收藏
页码:65 / 68
页数:4
相关论文
共 7 条