High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process

被引:4
|
作者
Kushwaha, Varun Kumar [1 ]
Sakuraba, Yuya [1 ]
Nakatani, Tomoya [1 ]
Sasaki, Taisuke [1 ]
Kurniawan, Ivan [1 ,2 ]
Miura, Yoshio [1 ]
Tajiri, Hiroo [3 ]
Hono, Kazuhiro [1 ,2 ]
机构
[1] Natl Inst Mat Sci, 1-2-1 Sengen, Tsukuba 3050047, Japan
[2] Univ Tsukuba, Grad Sch Sci & Technol, 1-1-1 Tennodai, Tsukuba 3058577, Japan
[3] Japan Synchrotron Radiat Res Inst, Sayo, Hyogo 6795198, Japan
来源
APL MATERIALS | 2022年 / 10卷 / 09期
基金
日本学术振兴会;
关键词
PHASE-STABILITY; MAGNETIC-PROPERTIES; MN;
D O I
10.1063/5.0117593
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Although an enhanced magnetoresistance (MR) has been observed in many Co-2-based Heusler alloys by promoting their structural ordering from B2 to L2(1) by post-annealing at higher temperatures (T-ann > 500 degrees C), it is desirable to search for other Heusler alloys that crystallize in L2(1)-order below 300 degrees C, as the maximum T-ann is restricted for processing devices. For Co(2)MnZ (Z = Ge, Sn) Heusler alloys, an L2(1)-order is expected to appear even in the as-deposited state or by a low-temperature annealing process due to their very high L2(1) to B2-order transition temperature (>1500 K). Here, epitaxial Co(2)MnZ films were grown on MgO (001) substrate at room temperature (RT) and post-annealed at Tann = 200-500 degrees C. Interestingly, as-sputtered films exhibit L2(1)-ordering, which improves systematically upon increasing Tann. The spin-polarization of electric current (beta) was estimated at RT using nonlocal spin-valve (NLSV) devices by measuring the spin-accumulation signal in a copper (Cu) channel. It was found that at T-ann = 300 degrees C, the beta value of Co2MnGe films is higher (similar to 0.65) than that of Co2FeGe0.5Ga0.5 films due to a higher degree of L2(1)-order, which makes the Co2MnGe alloy a promising ferromagnetic electrode for spintronic device applications. (C) 2022 Author(s).
引用
收藏
页数:7
相关论文
共 13 条
  • [1] Atomic disorder and magnetic property in Co-based Heusler alloys Co2MnZ (Z = Si, Ge, Sn)
    Kogachi, M.
    Fujiwara, T.
    Kikuchi, S.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 475 (1-2) : 723 - 729
  • [2] Quantitative analysis of anisotropic magnetoresistance in Co2MnZ and Co2FeZ epitaxial thin films: A facile way to investigate spin-polarization in half-metallic Heusler compounds
    Sakuraba, Y.
    Kokado, S.
    Hirayama, Y.
    Furubayashi, T.
    Sukegawa, H.
    Li, S.
    Takahashi, Y. K.
    Hono, K.
    APPLIED PHYSICS LETTERS, 2014, 104 (17)
  • [3] Magnetic behavior due to quenching temperature in co-based heusler-type alloys Co2MnZ (Z=Si, Ge, Sn)
    Kikuchi, Shigeyuki
    Fujiwara, Tetsuya
    Ishibashi, Hiroki
    Kogachi, Mineo
    ADVANCED INTERMETALLIC-BASED ALLOYS, 2007, 980 : 185 - +
  • [4] L 21 ordering of Co2FeSn thin films promoted by high-temperature annealing
    Fujiwara, Kohei
    Shibata, Koya
    Nishimura, Shunsuke
    Shiogai, Junichi
    Tsukazaki, Atsushi
    AIP ADVANCES, 2022, 12 (06)
  • [5] Insight into half-metallicity, spin-polarization and mechanical properties of L21 structured MnY2Z (Z = Al, Si, Ga, Ge, Sn, Sb) Heusler alloys
    Yousuf, Saleem
    Gupta, Dinesh C.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2018, 735 : 1245 - 1252
  • [6] Enhancement of L21 order and spin-polarization of Heusler alloy Co2MnSi thin film by Ag alloying
    Bosu, S.
    Sakuraba, Y.
    Sasaki, T. T.
    Li, S.
    Hono, K.
    SCRIPTA MATERIALIA, 2016, 110 : 70 - 73
  • [7] Polycrystalline Co2Mn-based Heusler thin films with high spin polarization and low magnetic damping
    Guillemard, C.
    Petit-Watelot, S.
    Rojas-Sanchez, J-C
    Hohlfeld, J.
    Ghanbaja, J.
    Bataille, A.
    Le Fevre, P.
    Bertran, F.
    Andrieu, S.
    APPLIED PHYSICS LETTERS, 2019, 115 (17)
  • [8] Analysis of L21-ordering in full-Heusler Co2FeSi alloy thin films formed by rapid thermal annealing
    Takamura, Yota
    Nakane, Ryosho
    Sugahara, Satoshi
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (07)
  • [9] Low-temperature, rapid thermal annealing of CIS thin films deposited by using a co-sputtering process with in and CuSe2 targets
    Nam-Hoon Kim
    Back-Sub Sung
    Young-Kil Jun
    Dong Hyun Chung
    Woo-Sun Lee
    Journal of the Korean Physical Society, 2015, 66 : 1001 - 1008
  • [10] Low-temperature, rapid thermal annealing of CIS thin films deposited by using a co-sputtering process with in and CuSe2 targets
    Kim, Nam-Hoon
    Sung, Back-Sub
    Jun, Young-Kil
    Chung, Dong Hyun
    Lee, Woo-Sun
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2015, 66 (06) : 1001 - 1008