Kinetic Monte Carlo simulation of shape transition of strained quantum dots

被引:13
|
作者
Lam, Chi-Hang [1 ]
机构
[1] Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
关键词
elasticity; Ge-Si alloys; island structure; Monte Carlo methods; nanofabrication; self-assembly; semiconductor growth; semiconductor quantum dots; solid-state phase transformations; surface energy; surface reconstruction; ISLAND GROWTH; 3; DIMENSIONS; HETEROEPITAXY;
D O I
10.1063/1.3483248
中图分类号
O59 [应用物理学];
学科分类号
摘要
The pyramid-to-dome transition in Ge(x)Si(1-x) on Si (100) initiated by step formation on pyramidal quantum dots is atomistically simulated using a multistate lattice model in two-dimensions incorporating effective surface reconstructions. Under quasiequilibrium growth conditions associated with low deposition rates, the transition occurs at island size n(c) following root nc similar to x(-1.69) independent of temperature and deposition rate. The shape transition is found to be an activated process. Results are explained by a theory based on simple forms of facet energies and elastic energies estimated using a shallow island approximation. An asymptotic scaling relation n(c)(1/d) similar to x(-2) for x -> 0 applicable to d=2 or 3 dimensions is derived. The shape transition energy barrier can be dominated by the interface energy between steep and shallow facets. (C) 2010 American Institute of Physics. [doi:10.1063/1.3483248]
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页数:8
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