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Electric Transport in Co-Rich Soft Magnetic Heterostructures
被引:0
|作者:
Pinzon-Escobar, Enrique Francisco
[1
]
Montiel, Herlinda
[1
]
Esparza-Garcia, Alejandro
[1
]
Alvarez, Guillermo
[2
]
机构:
[1] Univ Nacl Autonoma Mexico, Inst Ciencias Aplicadas & Tecnol, Mexico City 04510, DF, Mexico
[2] Univ Autonoma Ciudad Mexico, Colegio Ciencia & Tecnol, Mexico City 06720, DF, Mexico
关键词:
Magnetic anisotropy;
Strips;
Perpendicular magnetic anisotropy;
Amorphous magnetic materials;
Silicon;
Iron;
Saturation magnetization;
Magneto-electronics;
amorphous alloys;
magnetoresistance;
magnetic heterostructure;
thin films;
D O I:
10.1109/LMAG.2021.3120940
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
In this letter, a comparative electrical andmagnetic study between Co67Fe4Mo1Si17B11/Au/Co67Fe4Mo1Si17B11 and Co67Fe4Mo1Si17B11/Au/Ni heterostructures is presented. The heterostructures were deposited by means of dc magnetron sputtering. These samples consisted of three layers: a Co67Fe4Mo1Si17B11 layer with thicknesses of 30, 62, and 125 nm; a central Au layer with thicknesses of 5 nm; and a ferromagnetic top layer with thicknesses of 30 nm. Photolithography was employed to etch line patterns from 0.1 to 1 mm width and 1 cm length. The strip pattern induces a shape anisotropy in heterostructure. The magnetoresistance behavior suggests a correlation between electrical and magnetic properties as width function of the strip pattern.
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