Study of DC Magnetron Sputtered Nb Films

被引：6

作者：

Gao, He ^{[1
]}

Wang, Shijian ^{[1
]}

Xu, Da ^{[1
]}

Wang, Xueshen ^{[1
]}

Zhong, Qing ^{[1
]}

Zhong, Yuan ^{[1
]}

Li, Jinjin ^{[1
]}

Cao, Wenhui ^{[1
]}

机构：

[1] Natl Inst Metrol, Beijing 100029, Peoples R China

来源：

CRYSTALS | 2022年 / 12卷 / 01期

基金：

中国国家自然科学基金;

关键词：

superconducting films; DC magnetron sputtering; Ar pressure; stress; INTRINSIC STRESS; FABRICATION; JUNCTIONS; AL;

D O I：

10.3390/cryst12010031

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

As Nb films are widely used as superconducting electrodes of Josephson junctions, it is important to investigate the properties of Nb films in order to fabricate high-quality Josephson junctions. In this work, we conducted a comprehensive analysis of the relationships among the properties of DC magnetron sputtered Nb films with a constant power fabricated at the National Institute of Metrology (China). The film properties, including superconductivity, stress, lattice constant, and surface roughness, were investigated. It was found that in the case of constant power and Ar pressure, the stress and other parameters of the Nb films can maintain a relatively stable state during the continuous consumption of the target material.

引用

页数：8

共 50 条

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