Large-Area, Low-Voltage, Antiambipolar Heterojunctions from Solution-Processed Semiconductors

被引:109
|
作者
Jariwala, Deep [1 ]
Sangwan, Vinod K. [1 ]
Seo, Jung-Woo Ted [1 ]
Xu, Weichao [2 ]
Smith, Jeremy [3 ]
Kim, Chris H. [2 ]
Lauhon, Lincoln J. [1 ]
Marks, Tobin J. [1 ,3 ]
Hersam, Mark C. [1 ,3 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
[3] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
p-n heterojunction; carbon nanotube; indium gallium zinc oxide; van der Waals heterostructure; frequency; doubler; phase shift keying; CARBON NANOTUBES; GRAPHENE; HETEROSTRUCTURES; ELECTRONICS; GROWTH; SCALE;
D O I
10.1021/nl5037484
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The emergence of semiconducting materials with inert or dangling bond-free surfaces has created opportunities to form van der Waals heterostructures without the constraints of traditional epitaxial growth. For example, layered two-dimensional (2D) semiconductors have been incorporated into heterostructure devices with gate-tunable electronic and optical functionalities. However, 2D materials present processing challenges that have prevented these heterostructures from being produced with sufficient scalability and/or homogeneity to enable their incorporation into large-area integrated circuits. Here, we extend the concept of van der Waals heterojunctions to semiconducting p-type single-walled carbon nanotube (s-SWCNT) and n-type amorphous indium gallium zinc oxide (a-IGZO) thin films that can be solution-processed or sputtered with high spatial uniformity at the wafer scale. The resulting large-area, low-voltage pn heterojunctions exhibit antiambipolar transfer characteristics with high on/off ratios that are well-suited for electronic, optoelectronic, and telecommunication technologies.
引用
收藏
页码:416 / 421
页数:6
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