Build-up technology of a new ultrapure water supplying system

被引：0

作者：

Okumura, M ^{[1
]}

Haeno, H ^{[1
]}

Yokoi, I ^{[1
]}

Ohmi, T ^{[1
]}

机构：

[1] Kurita Water Ind Ltd, Shinjuku Ku, Tokyo 1608383, Japan

来源：

2003 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, CONFERENCE PROCEEDINGS | 2003年

关键词：

D O I：

10.1109/ISSM.2003.1243330

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have consumed a month for build-up time of a new supplying system of ultrapure water (UPW), which has been used for wafer cleaning. The reason for this is that a build-up time for the number of particles in UPW would be slow. Therefore, alkaline water cleaning was applied to a new UPW supplying system before H2O2 cleaning for sterilization, so that build-up time for the new UPW supplying system could be cut down to 1/3 compared to that for a conventional UPW supplying system.

引用

页码：475 / 478

页数：4

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