Defect structures of homoepitaxial diamond grown on various sites studied by transmission electron microscopy

被引:0
|
作者
Tarutani, M [1 ]
Takai, Y [1 ]
Shimizu, R [1 ]
机构
[1] OSAKA UNIV,FAC ENGN,DEPT APPL PHYS,SUITA,OSAKA 565,JAPAN
来源
DIAMOND FILMS AND TECHNOLOGY | 1996年 / 6卷 / 06期
关键词
cross-sectional transmission electron microscopy (XTEM); homoepitaxial diamond; internal and interface defects; analytical electron microscopy (AEM);
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Defect structures in a homoepitaxial diamond film grown by chemical vapor deposition (CVD) have been observed by cross-sectional transmission electron microscopy (XTEM). It was found that the homoepitaxial diamond still contains stacking faults and twins, especially in the interfacial regions grown on the (1(1) over bar1$) facet and the (1(1) over bar0$) edge, while dislocations are dominant in the upper regions. On the (001) face, however, the film does not contain such common defects, but does contain similar to <112>-aligned rows of interstitial dislocation loops with deformed configurations, indicative of defect decomposition from helical dislocations as a result of supersaturation of point defects. The density of these latter defects decreased in regions grown on the middle of the substrate. Many interstitial dislocation loops were also discerned lying in the (001) interface. Analytical electron microscopy (AEM) showed the presence of Fe and Si impurities only at the interface. The possible origins of the defects are discussed.
引用
收藏
页码:365 / 377
页数:13
相关论文
共 50 条
  • [1] Transmission electron microscopy study of interface and internal defect structures of homoepitaxial diamond
    Tarutani, M
    Takai, Y
    Shimizu, R
    Ando, T
    Kamo, M
    Bando, Y
    APPLIED PHYSICS LETTERS, 1996, 68 (15) : 2070 - 2072
  • [3] Conversions of a stacking fault to threading dislocations in homoepitaxial diamond growth studied by transmission electron microscopy
    Tsubouchi, Nobuteru
    APPLIED PHYSICS LETTERS, 2020, 117 (22)
  • [4] Homoepitaxial GaN layers studied by low-energy electron microscopy, atomic force microscopy and transmission electron microscopy
    Pavlovska, A
    Torres, VM
    Edwards, JL
    Bauer, E
    Smith, DJ
    Doak, RB
    Tsong, IST
    Thomson, DB
    Davis, RF
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1999, 176 (01): : 469 - 473
  • [5] The structures of point-defect-clusters in silicon studied by high resolution transmission electron microscopy
    Takeda, S
    ELECTRON MICROSCOPY 1998, VOL 3: MATERIALS SCIENCE 2, 1998, : 409 - 410
  • [6] Defect processes in semiconductors studied at the atomic level by transmission electron microscopy
    Schwander, P
    Rau, WD
    Kisielowski, C
    Gribelyuk, M
    Ourmazd, A
    IDENTIFICATION OF DEFECTS IN SEMICONDUCTORS, 1999, 51 : 225 - 259
  • [7] Characterization of irradiation defect structures and densities by transmission electron microscopy
    Kirk, Marquis
    Yi, Xiaoou
    Jenkins, Michael
    JOURNAL OF MATERIALS RESEARCH, 2015, 30 (09) : 1195 - 1201
  • [8] Transmission electron microscopy of sublimation-grown GaN single crystal and GaN homoepitaxial film
    Okada, T
    Kurai, S
    Naoi, Y
    Nishino, K
    Inoko, F
    Sakai, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1996, 35 (10B): : L1318 - L1320
  • [9] Characterization of irradiation defect structures and densities by transmission electron microscopy
    Marquis Kirk
    Xiaoou Yi
    Michael Jenkins
    Journal of Materials Research, 2015, 30 : 1195 - 1201
  • [10] Transmission electron microscopy of sublimation-grown GaN single crystal and GaN homoepitaxial film
    Tokushima Univ, Tokushima, Japan
    Jpn J Appl Phys Part 2 Letter, 10 B (L1318-L1320):