Singlet-triplet relaxation in SiGe/Si/SiGe double quantum dots

被引:13
|
作者
Wang, L.
Wu, M. W. [1 ]
机构
[1] Univ Sci & Technol China, Hefei Natl Lab Phys Sci Microscale, Hefei 230026, Anhui, Peoples R China
关键词
COMPUTATION; RESONANCE; TRANSPORT;
D O I
10.1063/1.3625240
中图分类号
O59 [应用物理学];
学科分类号
摘要
We study the singlet-triplet relaxation due to the spin-orbit coupling assisted by the electron-phonon scattering in two-electron SiGe/Si/SiGe double quantum dots in the presence of an external magnetic field in either Faraday or Voigt configuration. By explicitly including the electron-electron Coulomb interaction and the valley splitting induced by the interface scattering, we employ the exact-diagonalization method to obtain the energy spectra and the eigenstates. Then, we calculate the relaxation rates with the Fermi golden rule. We find that the transition rates can be effectively tuned by varying the external magnetic field and the interdot distance. Especially in the vicinity of the anticrossing point, the transition rates show intriguing features. We also investigate the electric-field dependence of the transition rates and find that the transition rates are almost independent of the electric field. This is of great importance in the spin manipulation, since the lifetime remains almost the same during the change of the qubit configuration from (1, 1) to (2, 0) by the electric field. (C) 2011 American Institute of Physics. [doi:10.1063/1.3625240]
引用
收藏
页数:8
相关论文
共 50 条
  • [1] Phonon-assisted relaxation and decoherence of singlet-triplet qubits in Si/SiGe quantum dots
    Kornich, Viktoriia
    Kloeffel, Christoph
    Loss, Daniel
    QUANTUM, 2018, 2
  • [2] Single-Shot Readout of Singlet-Triplet Qubit States in a Si/SiGe Double Quantum Dot
    Prance, Jon R.
    Shi, Zhan
    Simmons, C. B.
    Savage, D. E.
    Lagally, M. G.
    Schreiber, L. R.
    Vandersypen, L. M. K.
    Friesen, Mark
    Joynt, Robert
    Coppersmith, S. N.
    Eriksson, M. A.
    SIGE, GE, AND RELATED COMPOUNDS 5: MATERIALS, PROCESSING, AND DEVICES, 2012, 50 (09): : 655 - 662
  • [3] Tunable singlet-triplet splitting in a few-electron Si/SiGe quantum dot
    Shi, Zhan
    Simmons, C. B.
    Prance, J. R.
    Gamble, John King
    Friesen, Mark
    Savage, D. E.
    Lagally, M. G.
    Coppersmith, S. N.
    Eriksson, M. A.
    APPLIED PHYSICS LETTERS, 2011, 99 (23)
  • [4] Single-Shot Measurement of Triplet-Singlet Relaxation in a Si/SiGe Double Quantum Dot
    Prance, J. R.
    Shi, Zhan
    Simmons, C. B.
    Savage, D. E.
    Lagally, M. G.
    Schreiber, L. R.
    Vandersypen, L. M. K.
    Friesen, Mark
    Joynt, Robert
    Coppersmith, S. N.
    Eriksson, M. A.
    PHYSICAL REVIEW LETTERS, 2012, 108 (04)
  • [5] Singlet-triplet relaxation in multivalley silicon single quantum dots
    Wang, L.
    Shen, K.
    Sun, B. Y.
    Wu, M. W.
    PHYSICAL REVIEW B, 2010, 81 (23)
  • [6] Realizing singlet-triplet qubits in multivalley Si quantum dots
    Culcer, Dimitrie
    Cywinski, Lukasz
    Li, Qiuzi
    Hu, Xuedong
    Das Sarma, S.
    PHYSICAL REVIEW B, 2009, 80 (20)
  • [7] Coherent Manipulation of a SiGe-based Singlet-Triplet Qubit
    Croke, E. T.
    Borselli, M. G.
    Maune, B. M.
    Huang, B.
    Ladd, T. D.
    Deelman, P. W.
    Holabird, K. S.
    Kiselev, A. A.
    Alvarado-Rodriguez, I.
    Ross, R. S.
    Schmitz, A. E.
    Sokolich, M.
    Hazard, T. M.
    Gyure, M. F.
    Hunter, A. T.
    SIGE, GE, AND RELATED COMPOUNDS 5: MATERIALS, PROCESSING, AND DEVICES, 2012, 50 (09): : 823 - 829
  • [8] Singlet-triplet relaxation in two-electron silicon quantum dots
    Prada, M.
    Blick, R. H.
    Joynt, R.
    PHYSICAL REVIEW B, 2008, 77 (11)
  • [9] Toward Si/SiGe Quantum Dot Spin Qubits: Gated Si/SiGe Single and Double Quantum Dots
    Simmons, C. B.
    Prance, J. R.
    Thalakulam, Madhu
    Rosemeyer, B. M.
    Van Bael, B. J.
    Savage, D. E.
    Lagally, M. G.
    Joynt, R.
    Friesen, Mark
    Coppersmith, S. N.
    Eriksson, M. A.
    SIGE, GE, AND RELATED COMPOUNDS 4: MATERIALS, PROCESSING, AND DEVICES, 2010, 33 (06): : 639 - 647
  • [10] Elastic relaxation of dry-etched Si/SiGe quantum dots
    Darhuber, AA
    Grill, T
    Stangl, J
    Bauer, G
    Lockwood, DJ
    Noel, JP
    Wang, PD
    Torres, CMS
    PHYSICAL REVIEW B, 1998, 58 (08): : 4825 - 4831