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Fabrication, characterization and analysis of low threshold current density 1.55-mu m-strained quantum-well lasers
被引:23
|作者:
Mathur, A
[1
]
Dapkus, PD
[1
]
机构:
[1] UNIV SO CALIF,DEPT ELECT ENGN ELECTROPHYS,LOS ANGELES,CA 90089
关键词:
D O I:
10.1109/3.481869
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Tertiarybutylarsine and tertiarybutylphosphine are less hazardous alternatives to arsine and phosphine as group V sources for crystal growth of InxGa1-xAsyP1-y alloys by metalorganic chemical vapor deposition. Compressive and tensile-strained quantum-well lasers emitting at 1.55 mu m have been fabricated using these sources. Threshold current density as low as 93 A/cm(2), transparency current density as low as 38 A/cm(2) and internal efficiency of 91% were obtained for 1.5% compressive-strained single quantum-well lasers. These devices represent the best lasers emitting at this wavelength that have been reported in the literature. An analysis of some of the characteristics of these devices such as transparency current, differential gain and nonradiative recombination is also presented in this paper.
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页码:222 / 226
页数:5
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