EFFECTIVE SINOGRAM-INPAINTING FOR METAL ARTIFACTS REDUCTION IN X-RAY CT IMAGES

被引：10

作者：

Kim, Youngshin ^{[1
]}

Yoon, Seongbeak ^{[1
]}

Yi, Juneho ^{[1
]}

机构：

[1] Sungkyunkwan Univ, Comp Vis Lab, Seoul, South Korea

来源：

2010 IEEE INTERNATIONAL CONFERENCE ON IMAGE PROCESSING | 2010年

关键词：

Sinogram-inpainting; Metal artifacts reduction; X-ray CT imaging;

D O I：

10.1109/ICIP.2010.5652149

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This research features a new idea for effective sinogram inpainting that boosts the MAR (metal artifacts reduction) performance. We have indentified neighbor pixels that are relevant to the target pixel to be inpainted and only used these pixels in determining an inpainting value. Experimental results show that our methods based on the proposed idea significantly reduce inpainting errors, enhancing the MAR performance. They can be incorporated into any sinogram-inpainting based MAR algorithms.

引用

页码：597 / 600

页数：4

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